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In this presentation, we introduce a novel approach to machining surfaces using femtosecond (fs) UV laser systems. We explore the potential of these systems for large-area surface patterning, specifically in processing high band-gap materials like sapphire and yttrium aluminium garnet (YAG). The existing techniques are not satisfactory in terms of etch rates and accuracy, which our research is addressing. We demonstrate the use of two-beam fs-UV interference patterning to create harmonic gratings with exceptional accuracy. Key aspects include controlling the pulsed nature of the beams, optimizing pulse delay and spatial overlap, and comparing various beam splitting techniques. Our findings indicate that we can achieve sub-25 nm precision in material removal, which is a significant improvement over existing technologies. This research not only enhances the efficiency and accuracy of surface machining but also opens up new possibilities in advanced photonic applications.
Gailevičius et al. (Thu,) studied this question.