P‐11.5: Realization of High PPI Transparent TFT Backplane and Its Application in Micro‐LED Display

This paper mainly introduces the implementation method of a high PPI transparent Micro‐LED display. By optimizing the pixel layout, proposing an innovative substrate array structure and process method, and introducing a high brightness uniformity driving scheme, a 8.07” high PPI transparent Micro‐LED display is produced while maintaining high PPI, while also considering high transmittance and high brightness, which proposes a new technology carrier for Micro‐LED transparent display applications.