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In low-power electronics, there is a substantial demand for high-performance p-type oxide thin-film transistors (TFTs) that are capable of efficient operation at low voltages. In this study, we employ anodization to form an aluminum oxide gate dielectric layer, enabling the fabrication of p-type tin oxide (SnO) TFTs that effectively operate at a low voltage of 1 V. Under optimal device fabrication conditions, the SnO TFT demonstrates an on/off current ratio exceeding 103 and a saturation mobility of 1.94 cm2 V−1 s−1 at 1 V operation. The optimal SnO TFT fabrication conditions are subsequently used to fabricate a complementary inverter, comprising a SnO TFT and an n-type indium gallium zinc oxide TFT, achieving a gain of up to 38 at a 1 V supply voltage. Notably, the inverter’s switching point voltage is finely tuned to the ideal value, precisely half of the supply voltage. This oxide-based complementary inverter showcases promising potential in low-power electronics.
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Junjie Wang
Xiaoyu Lin
Yuxiang Li
AIP Advances
University of Manchester
Shandong University
Hanyang University
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Wang et al. (Mon,) studied this question.
www.synapsesocial.com/papers/68e6219fb6db6435875b3a6c — DOI: https://doi.org/10.1063/5.0215815