Magnetron carbon structures obtained by high-frequency magnetron sputtering in Argon and Nitrogen

Purpose of research. Creation and characterization of carbon nanostructures by high-frequency magnetron sputtering from a carbon target in argon on a silicon substrate and in a reactive nitrogen environment, obtained on a Ni catalyst buffer layer. Methods. High-frequency magnetron sputtering on a silicon substrate with changes in control parameters: sputtering time power and working gas pressure Ar and N. Research was carried out using X-ray phase analysis, atomic force microscopy and holographic microscopy, Raman scattering. Results. The formation of carbon nanotubes, including single-walled ones, was confirmed by the method of Raman scattering of light along the lines ID 1363 and IG 1564 cm-1, as well as ωRDМ 308 and 227 cm–1. Using atomic force microscopic images, the fractal dimension of the nanofilms was calculated, which indicated their 3D nature. Based on X-ray phase analysis of magnetron nanofilms, the dimensions of the coherence region, texture, microdeformations and interplanar deformation distortions were determined. Conclusion. I n carbon magnetron nanofilms, deformations of both signs occur: both compressive (∆a 0). Carbon magnetron nanofilms are represented, among other things, by single-walled carbon nanotubes, the chirality of which in an argon environment is (6, 6), and in a reactive mixture of nitrogen and argon on a Ni buffer layer (7, 7). It was discovered that in high-frequency magnetron mode, silicon carbide is formed in both inert and reactive environments.