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A Fresnel zone plate (EFZP) with an extended depth of focus can maintain focused monochromatic light at different distances compared to a general Fresnel zone plate (FZP). The focal distances are determined by dividing the zone plate into multiple areas based on the desired order. The EFZP has potential applications in various research fields such as microscopy, direct laser lithography, and optical coherence tomography. However, manufacturing an EFZP is challenging due to the high precision requirements and difficulties associated with the calculation and simulation processes. In this research, a complete process is presented to design, simulate, and fabricate an EFZP using a Fourier optics design, simulations, and a direct laser lithographic machine. The resulting EFZP has an increased depth of focus of about nine times compared to a general Fresnel zone plate with similar parameters, while maintaining the focal spot diameter. The performance of this EFZP is evaluated through optical verification and mathematical simulation methods.
Trung et al. (Wed,) studied this question.