August 1, 2025

Insight into Mechanisms of Electronic Sputtering in Gold-Silica Nanocomposite: Effect of Size of Au Nanoparticle

Key Points

Larger nanoparticles reduce electronic sputtering yield, suggesting size inversely influences yield.
Post-irradiation analysis revealed a notable correlation: increased size leads to decreased sputtering yield.
Au:SiO₂ films were deposited using atom beam sputtering, followed by annealing to optimize nanoparticle size.
Highlights the significance of nanostructure dimensions in ion–matter interactions with potential applications.

Abstract

This research examines the electronic sputtering characteristics of Au:SiO₂ nanocomposite thin films, focusing on size dependence, when subjected to 100 MeV Ag ion irradiation. Au:SiO₂ films were deposited on quartz substrates through atom beam sputtering, subsequently undergoing controlled annealing at 850°C in an Ar atmosphere to optimize the nanoparticle size. The progression of nanoparticle dimensions and their optical characteristics was observed via UV–Visible spectroscopy, validating an increase in size following the annealing process. Post-irradiation analysis employing Rutherford Backscattering Spectrometry (RBS) demonstrated a distinct inverse correlation between the size of nanoparticles and the sputtering yield. The results show that as nanoparticle size increases, the electronic sputtering yield decreases, highlighting the crucial role that nanostructure dimensions play in swift heavy ion–matter interactions.

Insight into Mechanisms of Electronic Sputtering in Gold-Silica Nanocomposite: Effect of Size of Au Nanoparticle

Key Points

Abstract

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