In optics , electronics , medicine , renewable In energy , ecology And Existing in other fields of science or technology Challenges today requires that By them Used Materials to have Special Features, quality And To achieve economic Efficiency . Accordingly , it acquires special importance. Innovative , ecologically Clean High Technology Development And Their For commercialization Promotion . In a vacuum Magnetron Spraying The very technologies In line Belongs to , whose Meaning Especially It was revealed Modern In the presence of challenges . The same is indicated by scientific Literature Review also . Researchers Vacuum In the environment Stationary planar magnetron Spraying At the time Thin With the receipt of the deposits Regarding Important Difficulties are faced with . A detailed study of this technique-technology allows for a logical explanation of the existing difficulties. This Difficulties Includes Significant changes observed during production processes Economic Losses And as Technological processes, as well as the resulting Results instability , which It is unambiguously determined by the target. Spraying Zone Inhomogeneity. The inhomogeneity of the sputtering zone, in turn, is caused by the specific configuration of the magnetic field on and near the target surface and its static nature. In this article, we will discuss an innovative solution related to the technology of planar magnetron sputtering in vacuum. We present a planar-rotary magnetron sputtering device that can successfully solve the difficulties faced by magnetron sputtering in vacuum and, accordingly, make a breakthrough in materials science, especially in the direction of the synthesis of mono- and multi-component thin coatings.
Berishvili et al. (Wed,) studied this question.
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