Tetramethylammonium hydroxide (TMAH), a toxic and persistent compound widely used in semiconductor manufacturing, was degraded using underwater plasma at applied fields ranging from 0.8 to 10 kV mm⁻1. Optical emission spectroscopy revealed OH(A–X), Hβ, and O I features, with Stark broadening of Hβ indicating electron densities between 5.0 × 1024 and 11.8 × 1024m⁻3, characteristic of high-field discharge. Spectral analysis showed a field-dependent shift from OH-dominated to O-dominated chemistry. Total organic carbon (TOC) removal followed pseudo-first-order kinetics, with rate constants increasing from 3.6 × 10⁻3 to 7.7 × 10⁻3 min⁻1 but plateauing above 4.8 kV mm⁻1. Ion chromatography detected NH4+ and NO3⁻ accumulation, suggesting that oxidative flux was partially diverted toward nitrogen conversion, thereby competing with carbon mineralization.
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Ki‐Taik Lee
Hana Lim
Sung Cheol Park
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Lee et al. (Wed,) studied this question.
www.synapsesocial.com/papers/69a1357fed1d949a99abf7d2 — DOI: https://doi.org/10.34657/30393