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SF6 is a strong greenhouse effect gas, which is widely used in high-voltage electrical equipment such as circuit breakers and high-voltage switchgear because of its excellent insulation performance and arc extinguishing ability. In recent years, the use and emission of SF6 have been rising, and with the proposal of the dual carbon strategic goal, its harmless degradation has become an urgent problem to be solved. In this paper, SF6 was degraded by pulsed DBD plasma technology and O2. Studies have shown that the addition of O2 can effectively promote the degradation of SF6. With the increase in the added O2 content, the DRE and EY of SF6 first increased and then decreased. Under the conditions of the input power of 50 W, SF6 concentration of 2%, and gas flow rate of 50 mL/min, the reaction system obtained the highest DRE and EY of 58.40% and 5.24 g/kWh when the O2 content was 1%, respectively. In the SF6/Ar/O2/H2O system, the addition of H2O could improve the product selectivity of SO2F2, and when the O2 concentration was 1%, the highest selectivity of SO2F2 was 48.96%, and the concentration was 8006.76 ppm. The addition of O2 inhibited the production of SO2, and with the addition of the O2 system, SO2F2 and SOF4 were the main components of degradation products; however, there were also SOF2, SO2, SiF4, SF4, etc. In this paper, the decomposition path of O2 under SF6 was analyzed in detail according to infrared spectroscopy and decomposition products.
Zhang et al. (Wed,) studied this question.