Key points are not available for this paper at this time.
Microsphere photolithography (MPL) uses self-assembled hexagonal close-packed microspheres as optical elements to produce photonic nanojets (PNJ) in a layer of photoresist. The information required for hierarchical patterning is embedded in the illumination light field. In this work, dual spatial light modulator (SLM) system is employed to attain precise control over the light field in MPL, which can significantly enhance the flexibility and efficiency of the fabrication process. A digital micro device (DMD) located at the front Fourier plane is used to control the AOI at the back focal plane. A liquid crystal (LC) device is placed in the intermediate image plane to regulate the local illumination intensity, which is subsequently projected onto the image stage. Both the DMD and SLM encode the illumination AOI and intensity received by each microsphere. The resolution and control processes of the system are investigated. The capability is demonstrated by creating functional hierarchical metasurfaces.
Kinzel et al. (2024) studied this question.