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March 3, 2026Advanced Materials0 citations

BiO(IO 3 ) with Ultrahigh Effective Atomic Number and Density for Sensitive and Stable Hard X‐Ray Detection

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HRHaiyu RenLanzhou University of TechnologyYXYoukui XuFCFeifei ChaiHenan Agricultural University

Key Points

  • Enhanced x-ray absorption achieves a high sensitivity of 4563 µC Gyair-1 cm-2 for ∼25 keV photons, showing the material's effectiveness in detection.
  • The material boasts an ultrahigh effective atomic number of 72.29 and a density of 7.399 g/cm3, which improve detection capabilities significantly.
  • Development involved designing a compact 2D BiO(IO3) crystal lattice, which helps maintain high-Z elements while addressing stability issues in X-ray detection materials.
  • Results indicate excellent stability and no performance degradation after prolonged exposure to high voltage and temperature, highlighting its potential for real-world applications.

Abstract

Bismuth halide perovskites are promising materials for hard X-ray detection owing to their high effective atomic number (Zeff) and excellent optoelectronic properties. However, the reported A-site cations or pseudohalides to address chemical stability issues inevitably reduce material Zeff/density and aggravate electron localization. These changes significantly degrade X-ray absorption and charge transport, ultimately undermining detection performance. Herein, we chose the oxidized I5+ to replace I-, and designed 2D BiO(IO3). This substitution yields a significantly more compact crystal lattice while retaining two high-Z elements (Bi and I), affording the material an ultrahigh Zeff (72.29) and density (7.399 g/cm3), which greatly enhances hard X-ray absorption. Concurrently, the small effective mass of the material facilitates efficient carrier transport, resulting in a high device sensitivity of 4563 µC Gyair -1 cm-2 for ∼25 keV X-ray photons. Furthermore, the formation of strong Bi-O and I-O bonds endows the material with excellent stability, leading to a high ion migration activation energy of 0.73 eV. Specifically, polycrystalline wafers with a thickness of 1 mm were successfully fabricated and showed no performance degradation after long time continuous aging test (160 kV X-ray, high voltage, temperature, etc.). This work provides a promising solution for developing high-performance hard X-ray detection materials.

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Cite This Study

Ren et al. (2026) studied this question.

synapsesocial.com/papers/69a75a68c6e9836116a202bchttps://doi.org/10.1002/adma.202518602
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