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December 15, 2016Journal of Materials Chemistry C45 citationsOpen Access

The impact of post-deposition annealing on the performance of solution-processed single layer In2O3 and isotype In2O3/ZnO heterojunction transistors

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KTKornelius TetznerIIIvan IsakovARAnna Regoutz

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Abstract

The influence of annealing temperature on electron transport in single layer In2O3 and isotype In2O3/ZnO heterojunction channel transistors is investigated.

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Cite This Study

Tetzner et al. (2016) studied this question.

synapsesocial.com/papers/69d905fa0e1b46d093ae2b75https://doi.org/10.1039/c6tc04907a
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