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Investigating the effects of local scattering mechanisms is of great importance to understand charge transport in semiconductors. This article reports measurements of the hole transport properties of boron-doped (100) single-crystalline chemical vapor deposited diamond. A Time-of-Flight measurement using a 213 nm, pulsed UV laser for excitation, was performed on high-purity single-crystalline diamonds to measure the hole drift velocity in the low-injection regime. The measurements were carried out in the temperature range 10-80 K. The results obtained are directly applicable to low-temperature detector applications. By comparing our data to Monte-Carlo simulations, a detailed understanding of the dominating hole scattering mechanisms is obtained.
Majdi et al. (2013) studied this question.