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June 12, 2018IEEE Electron Device Letters206 citations

Effects of Capping Electrode on Ferroelectric Properties of Hf0.5Zr0.5O2 Thin Films

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RCRongrong CaoYWYan WangSZShengjie Zhao

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Abstract

In this letter, effects of top electrodes (TEs) on ferroelectric properties of Hf 0.5 Zr 0.5 O 2 (HZO) thin films are examined systematically. The remnant polarization (Pr) of HZO thin films increases by altering TEs with lower thermal expansions coefficient (α). The largest 2P r value of 38.72 μC/cm 2 is observed for W TE with α = 4.5 × 10 -6 /K, while the 2P r value is only 22.83 μC/cm 2 for Au TE with α = 14.2 × 10 -6 /K. Meanwhile, coercive field (E c ) shifts along the electric field axis and the offset is found to be dependent on the difference of workfunctions (WFs) between TE and TiN bottom electrode (BE). E c shifts toward negative/positive direction, when the WF of TE is larger/smaller (Pt, Pd, Au/W, Al, Ta) than TiN BE. This letter provides an effective way to modulate HfO 2 -based device performance for different requirements in actual application.

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Cite This Study

Cao et al. (2018) studied this question.

synapsesocial.com/papers/69dbd88dc9a120f055a3cb80https://doi.org/10.1109/led.2018.2846570
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