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May 29, 2026Applied Physics Letters0 citations

Afterpulsing suppression in 4H-SiC avalanche photodiodes by sub-bandgap photoexcitation

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HSHong SongBeijing Institute of TechnologyAHAnqi HuBeijing University of Posts and TelecommunicationsXZXicheng ZhangXihua University

Key Points

  • This research aims to clarify the relationship between afterpulsing and trap states in silicon carbide avalanche photodiodes, and to develop a method to suppress afterpulsing.
  • Developed a sub-bandgap optical excitation technique to release carriers from trap states
  • Evaluated the effect on afterpulsing probability and dark count rate
  • Measured photon detection efficiency at specific wavelength
  • Achieved a 37% reduction in afterpulsing probability without increasing dark count rate
  • Optimized device performance with a 22% reduction in dark count rate
  • Maintained a photon detection efficiency of 29% at 285 nm

Abstract

Dark counts in silicon carbide avalanche photodiodes (SiC APDs) significantly limit their signal-to-noise ratio and overall performance, with afterpulsing being a major contributing factor. However, the specific correlation mechanisms between afterpulsing and trap states in SiC remain unclear, posing challenges for effective suppression. This work elucidates the influence mechanisms of shallow-level and deep-level traps on the temporal characteristics of afterpulsing in 4H-SiC APD. Based on these findings, we develop an innovative sub-bandgap optical excitation method that facilitates rapid carrier release from trap states, effectively reducing afterpulsing. This approach achieves a 37% reduction in afterpulsing probability without increasing the primary dark count rate. The proposed technique optimizes overall device performance by reducing dark count rate by 22% while maintaining high photon detection efficiency of 29% at 285 nm, ultimately improving the signal-to-noise ratio of the APDs.

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Cite This Study

Song et al. (2026) studied this question.

synapsesocial.com/papers/6a192e68fab5b468c441769ahttps://doi.org/10.1063/5.0334643
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