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August 15, 1985Journal of Applied Physics39 citations

Dark current transport mechanism of p-i-n hydrogenated amorphous silicon diodes

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HMHideharu MatsuuraAMAkihisa MatsudaHOHideyo Okushi

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Abstract

The dark current-voltage characteristics of p-i-n hydrogenated amorphous silicon diodes with various thicknesses of the intrinsic layer (i-layer) (770–9300 Å) are systematically investigated. The magnitude of the forward current is found to be independent of thickness of the i layer, which is obviously against the simple conventional junction theory. It has been demonstrated through various experiments that the forward current of amorphous p-i-n diodes is limited by a layer thinner than 770 Å, possibly being the p/i interface or a narrow zone of the i layer.

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Cite This Study

Matsuura et al. (1985) studied this question.

synapsesocial.com/papers/6a712b1826a7f98052dd933dhttps://doi.org/10.1063/1.336044
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