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June 15, 2003Japanese Journal of Applied Physics97 citations

292 nm AlGaN Single-Quantum Well Light Emitting Diodes Grown on Transparent AlN Base

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AHAmy HanlonPPP. Morgan PattisonJKJohn F. Kaeding

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Abstract

We report the use of a novel transparent AlN base layer to achieve sub-300 nm electroluminescence from an AlGaN p - n junction single quantum well light emitting diode grown on sapphire by metal organic chemical vapor deposition. For unpackaged devices tested on wafer at a continuous current of 120 mA, an optical power of 2.4 µW was achieved. Peak emission was 292 nm, with very little secondary wavelength emission.

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Hanlon et al. (2003) studied this question.

synapsesocial.com/papers/6a718df4439bab0cabc39ca1https://doi.org/10.1143/jjap.42.l628
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