PulseExploreJournal ClubDebatesTrendingResearchersJournals
Instagram
HomeExploreJournal ClubTrending
Synapse
⌘+K
Synapse
July 1, 2003Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena49 citations

Measurement of work function of transition metal nitride and carbide thin films

View Full Paper
YGYasuhito GotohHTHiroshi TsujiJIJunzo Ishikawa

Key Points

Key points are not available for this paper at this time.

Abstract

Work functions of transition metal nitride and carbide thin films were measured. The materials investigated were ZrN, NbN, HfN, TaN, HfC, and TaC. The films were prepared either by radio-frequency magnetron sputter deposition or by ion beam assisted deposition. The work function was measured by Kelvin probe in air. The work functions of ZrN and HfN ranged between 4.6 and 4.7 eV, and were similar to or slightly lower than that of NbN and TaN, 4.7 or 4.8 eV. The work function of TaC was approximately 5.0 eV. The higher work function of carbide may be attributed to lower electronegativity of carbon as compared to nitrogen.

Ask AI
Helpful
Bookmark
Share
View Full Paper

Cite This Study

Gotoh et al. (2003) studied this question.

synapsesocial.com/papers/6a827c07fe5ce613f33ad218https://doi.org/10.1116/1.1591749
Ask AI
Helpful
Bookmark
Share
View Full Paper