Enhanced Current Saturation in IGZO Thin Film Transistors Using a Source-Connected Bottom Gate Structure

Channel length modulation (CLM) in indium gallium zinc oxide (IGZO) thin film transistors (TFTs) reduces the output resistance (ro) in the saturation regime. It also degrades current driving accuracy for active matrix organic light emitting diode (AMOLED) backplanes. For top gate, self-aligned devices with nominal channel lengths of 5–15 μm, transmission line method (TLM) analysis yields an effective channel length reduction (ΔL) of about 1.8 μm. This result is consistent with lateral hydrogen redistribution from the self-aligned source/drain (S/D) process. At L = 5 μm, the conventional TFT exhibits ro = 13.5 ± 2.5 MΩ and an Early voltage (VA) = 56.1 ± 10.4 V (n = 5). We propose a source connected bottom gate (SCBG) structure that electrostatically stabilizes the pinch-off region and suppresses CLM. The SCBG TFT increases ro to 475 ± 52 MΩ and VA to 1159 ± 173 V at L = 5 μm (n = 5), while maintaining normal transfer characteristics. Two-dimensional device simulations reproduce the trend and show that the drain-bias-induced pinch-off shift is reduced, with d(ΔL)/dVDS decreasing from 0.027 to 0.012 μm/V (about 55%). These results indicate that the SCBG approach is effective for enhancing current saturation in short channel IGZO TFTs for high-resolution AMOLED applications.