This study proposes a new method to generate silicon substrates with a thickness of less than 100 μm using surface tension and electromagnetic pressure. The authors previously conducted substrate generation experiments using electromagnetic pressure. However, the thickness did not reach the target of 100 μm. Therefore, to solve the problem of thickness reduction, the authors increased the number of AC magnetic field generators to two in the substrate generation experiment and investigated their effectiveness. Focusing on the increase in Joule heating due to the increase in the number of AC magnetic field generators, we calculated the heat balance of the entire experimental apparatus and investigated the temperature on the stage during the application of the magnetic field.
Ibuki et al. (Wed,) studied this question.
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