One‐Step Radical‐Intensified Selective Etching (RISE) Strategy for High‐Yield Synthesis of Monolayer MXene with Tailored Nanoholes

Key Points

• To present a method for synthesizing monolayer MXene with tailored nanoholes for enhanced performance.
• Introduced a one-step radical-intensified selective etching strategy for MXene synthesis.
• Compared performance with traditional wet chemical etching methods.
• Achieved high-yield synthesis of monolayer MXene with controlled nanohole structures.
• Demonstrated improved performance in capacitive deionization over existing MXene-based electrode materials.