Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching

ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTArea-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective EtchingMartijn F. J. VosMartijn F. J. VosDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The NetherlandsMore by Martijn F. J. Voshttp://orcid.org/0000-0002-7380-5032, Sonali N. ChopraSonali N. ChopraDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The NetherlandsMcKetta Department of Chemical Engineering, The University of Texas at Austin, 200 East Dean Keeton Street, Stop C0400, Austin, Texas 78712, United StatesMore by Sonali N. Chopra, Marcel A. VerheijenMarcel A. VerheijenDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The NetherlandsMore by Marcel A. Verheijen, John G. EkerdtJohn G. EkerdtMcKetta Department of Chemical Engineering, The University of Texas at Austin, 200 East Dean Keeton Street, Stop C0400, Austin, Texas 78712, United StatesMore by John G. Ekerdthttp://orcid.org/0000-0002-1788-5330, Sumit AgarwalSumit AgarwalDepartment of Chemical and Biological Engineering, Colorado School of Mines, 1613 Illinois Street, Golden, Colorado 80401, United StatesMore by Sumit Agarwal, Wilhelmus M. M. KesselsWilhelmus M. M. KesselsDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The NetherlandsMore by Wilhelmus M. M. Kesselshttp://orcid.org/0000-0002-7630-8226, and Adriaan J. M. Mackus*Adriaan J. M. MackusDepartment of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands*(A.J.M.M.) E-mail: email protectedMore by Adriaan J. M. Mackushttp://orcid.org/0000-0001-6944-9867Cite this: Chem. Mater. 2019, 31, 11, 3878–3882Publication Date (Web):May 22, 2019Publication History Received15 January 2019Revised20 May 2019Published online22 May 2019Published inissue 11 June 2019https://pubs.acs.org/doi/10.1021/acs.chemmater.9b00193https://doi.org/10.1021/acs.chemmater.9b00193rapid-communicationACS PublicationsCopyright © 2019 American Chemical Society. This publication is licensed under CC-BY-NC-ND. This publication is Open Access under the license indicated. Learn MoreArticle Views9878Altmetric-Citations73LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail PDF (2 MB) Get e-AlertscloseSupporting Info (1)»Supporting Information Supporting Information SUBJECTS:Atomic layer deposition,Deposition,Etching,Platinum,Selectivity Get e-Alerts