Alkylation of Si Surfaces Using a Two-Step Halogenation/Grignard Route

ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTAlkylation of Si Surfaces Using a Two-Step Halogenation/Grignard RouteAshish Bansal, Xiuling Li, Iver Lauermann, Nathan S. Lewis, Sang I. Yi, and W. H. WeinbergView Author Information Division of Chemistry and Chemical Engineering California Institute of Technology Pasadena, California 91125 Department of Chemical Engineering, University of California, Santa Barbara, California 93106 Cite this: J. Am. Chem. Soc. 1996, 118, 30, 7225–7226Publication Date (Web):July 31, 1996Publication History Received1 February 1996Published online31 July 1996Published inissue 1 January 1996https://pubs.acs.org/doi/10.1021/ja960348nhttps://doi.org/10.1021/ja960348nrapid-communicationACS PublicationsCopyright © 1996 American Chemical SocietyRequest reuse permissionsArticle Views3571Altmetric-Citations404LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose SUBJECTS:Alkyls,Desorption,Functionalization,Oxidation,Silicon Get e-Alerts