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Carbon nitride films deposited by three different methods have been analyzed using in situ Auger electron spectroscopy and ex situ x-ray photoelectron spectroscopy (XPS) and Rutherford backscattering spectrometry. The XPS data for all 27 samples indicate that these films have a similar composition consisting of two phases. One phase has a stoichiometry near C₃N₄ and is identified as a tetrahedral component. The other phase has a variable stoichiometry from C₅N to C₂N and is identified as predominantly an sp^2 bonded structure. For a film composition of N/C 1, the tetrahedrally bonded component grows only moderately as the nitrogen content of the films is increased.
Marton et al. (Mon,) studied this question.