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A new, robust technique for preparing highly selective molecularly imprinted films (see Figure) is presented. Spin‐coating is used to spread a pre‐polymerization mixture on a substrate, which is subsequently cured with UV light. Important aspects of this technique include the use of a novel polymeric porogen dissolved in a low‐volatility solvent to generate porous morphologies with enhanced binding capacities.
Schmidt et al. (Mon,) studied this question.