October 30, 2006

Increased electron mobility in n-type Si-doped AlN by reducing dislocation density

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Abstract

For n-type Si-doped AlN with a low Si doping concentration of 3×1017cm−2, a high room-temperature electron mobility of 426cm2V−1s−1 was achieved, and at 220K the mobility reached 730cm2V−1s−1, the highest value ever reported for AlN. At Si doping concentrations lower than 1018cm−3, dislocation scattering is the most dominant scattering mechanism, and the mobility can therefore be increased significantly by reducing the dislocation density.

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Taniyasu et al. (Mon,) studied this question.

synapsesocial.com/papers/69df3d6facbf09c32e614698 https://doi.org/https://doi.org/10.1063/1.2378726

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