Onto Innovation (United States)

Recent papers from Onto Innovation (United States)

1. Reverse Osmosis Pressure Vessel with Bypass Flows: Optimized Flow Rate and Location for Reduced Energy ConsumptionACS ES&T Engineering · 2026
2. Mid-infrared ellipsometry for optical critical dimension metrologyJournal of Applied Physics · 2026
3. Non-destructive lateral cavity etch measurements of 8-superlattice layer nanowire test structures using optical Mueller matrix spectroscopic ellipsometry, x-ray diffraction, and x-ray fluorescenceJournal of Applied Physics · 2025
4. Superlattice effects and limitations of non-destructive measurement of advanced Si/Si1−xGex superlattice structures using Mueller matrix scatterometry and high-resolution X-ray diffractionJournal of Micro/Nanopatterning Materials and Metrology · 2024
5. Nanocolumnar Metamaterial Platforms: Scaling Rules for Structural Parameters Revealed from Optical AnisotropyAdvanced Optical Materials · 2024
6. 3D NAND Oxide/Nitride Tier Stack Thickness and Zonal Measurements With Infrared MetrologyIEEE Transactions on Semiconductor Manufacturing · 2024
7. Overlay Challenges of Extremely Large Exposure Field, Fine Resolution Lithography Due to Alignment Solution Errors and a Solution Using Early Zone Corrections in Advanced IC Substrates2024
8. Observations on Macroscopic Surface Modification and Oxidation of Tungsten and Tungsten Carbide in Laser Focus in AirFusion Science & Technology · 2024
9. Addressing Advanced IC Substrate Deformation and Pattern Distortion using an Extremely Large Exposure Field Fine-Resolution Lithography System2024
10. Superlattice effects and limitations of non-destructive measurement of advanced Si/Si(1-x)Ge(x) superlattice structures using Mueller matrix scatterometry (MMSE) and high-resolution x-ray diffraction (XRD)2024
11. Non-destructive measurement of bottom width in deep trench isolation structures using IRCD metrology2024
12. Advanced FTIR optical modeling for hydrogen content measurements in 3D NAND cell nitride and amorphous carbon hard mask2024
13. Metrology challenges for fabrication of high aspect ratio, nano scale x-ray diffraction gratings2024
14. Using Outlier Control Technology with Feedforward Lithography to Address Die Shifting and Pattern Distortion Challenges in Fan-Out Panel-Level PackagingIMAPSource Proceedings · 2024
15. Using deep learning ADC for defect classification for automatic defect inspection2024
16. Addressing Advanced IC Substrate Deformation and Pattern Distortion Using an Extremely Large Exposure Field Fine Fine-Resolution Lithography SystemIMAPSource Proceedings · 2023
17. Inspection Solution for 2μm RDL from Wafer-Level to Panel-Level Fan-out ProcessIMAPSource Proceedings · 2023
18. Metal−Organic Precursors for Transition‐Metal‐Doped Ni2P via Pyrolysis for Efficient Overall Water Splitting and SupercapacitanceEuropean Journal of Inorganic Chemistry · 2023
19. Solvent-assisted sulfur vacancy engineering method in MoS 2 for a neuromorphic synaptic memristorNanoscale Horizons · 2023
20. Efficient pump-probe sampling with a single-cavity dual-comb laser: Application in ultrafast photoacousticsPhotoacoustics · 2022