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May 28, 2024

Overlay Challenges of Extremely Large Exposure Field, Fine Resolution Lithography Due to Alignment Solution Errors and a Solution Using Early Zone Corrections in Advanced IC Substrates

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JCJohn ChangOnto Innovation (United States)XSXing SongTCTimothy ChangOnto Innovation (United States)

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Chang et al. (2024) studied this question.

synapsesocial.com/papers/68e68365b6db64358760bd60https://doi.org/10.1109/ectc51529.2024.00353
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