Esgee Technologies (United States)

Recent papers from Esgee Technologies (United States)

1. A National Description of EMS Patient Utilization PatternsHealth Affairs Scholar · 2026
2. Scientific Priorities Related to the Use of Double Sequential External Defibrillation in Patients With Refractory Cardiac Arrest: Report From a Multistakeholder ThinktankSHILAP Revista de lepidopterología · 2025
3. Effect of radio frequency bias on the ion extraction from high-density electropositive plasmasJournal of Applied Physics · 2025
4. Runaway Electrons in Gas Discharges: Insights from the Numerical ModelingPlasma · 2025
5. Electron kinetics near the minimum of Paschen's curves of pulsed breakdownPhysics of Plasmas · 2024
6. Computational analysis of the anode-directed streamers propagation in atmospheric pressure C4F7N/N2 mixturesJournal of Applied Physics · 2024
7. Influence of the Dufour effect on striations formation in radio-frequency dischargesPhysics of Plasmas · 2024
8. Computational simulations of spatio—temporal plasma dynamics in a very high frequency capacitively coupled reactorJournal of Physics D Applied Physics · 2023
9. Kinetics of the fast ionization waves with runaway electronsPhysics of Plasmas · 2023
10. Robust Statistical Approach for Determination of Graphite Nitridation Using Bayesian Model ComparisonJournal of Thermophysics and Heat Transfer · 2023
11. Silicon etching by chlorine plasma: Validation of surface reactions mechanismJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2023
12. Investigation of the significance of excited species in wave-heated dense non-ideal microplasmas using particle-in-cell Monte Carlo-collision modelingAIP Advances · 2023
13. Computational analysis of electrical breakdown of SF6/N2 mixturesJournal of Applied Physics · 2023
14. Limitations of the independent control of ion flux and energy distribution function in high-density inductively coupled chlorine plasmasJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2022
15. On the chemistry mechanism for low-pressure chlorine process plasmasJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2022
16. Transient phenomena during dense argon micro-plasma formationJournal of Physics D Applied Physics · 2022
17. Influence of the electron kinetics on Ar/NF3 inductively coupled plasmaJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2022
18. Optimization of silicon etch rate in a CF4/Ar/O2 inductively coupled plasmaJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2022
19. Influence of electron energy distribution on fluid models of a low-pressure inductively coupled plasma dischargePhysics of Plasmas · 2022
20. Feasibility of prehospital esmolol for refractory ventricular fibrillationJournal of the American College of Emergency Physicians Open · 2022