Harnessing Scanning Probe Lithography for Integrated Photonics with Anisotropic Materials

Key Points

• The aim is to develop damage-free fabrication techniques for integrating high-index, wide-bandgap semiconductors into nanophotonic circuits.
• Utilized scanning probe lithography to achieve integration.
• Focused on the mechanical anisotropy of layered semiconductors.
• Successfully demonstrated a crystallography-guided technique.
• Achieved improved fabrication compatibility with layered semiconductors.