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Memristors, as neural synapse devices, have been regarded as excellent candidates for non-von Neumann architecture because of their high scalability. However, the randomness of the filaments of state-of-the-art filamentary memristors leads to high variability and poor reliability. Herein, a semimetal bismuth (Bi)-based memristor with oxygen vacancy (V O )–Bi filaments was proposed. The Bi-based memristor has a subquantum conductance change, high switching consistency, and controllable weight update linearity. Through spherical aberration-corrected scanning transmission electron microscopy (AC-STEM) and density functional theory (DFT) calculations, the formation mechanism of V O and Bi clusters in the filaments and the overall switching mechanism of the V O –Bi filaments were elucidated. Specifically, V O provides a conductive path while Bi ions migrate, leading to the reduction of Bi clusters in the SiO 2 layer. Furthermore, artificial neural network (ANN) simulations based on back-propagation and reservoir computing (RC) systems achieved large digit recognition accuracies of 95.77 and 94.15%, respectively.
Zhuge et al. (Tue,) studied this question.
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