Up to 48× Density Multiplication Achieved by Directed Self-Assembly on Plasma-Trimmed Honeycomb Templates

Achieving pattern density multiplication through direct self-assembly (DSA) is a viable path to increasing manufacturing throughput and reducing costs in photolithographic manufacturing. However, as the density multiplication factor increases, current process flows face challenges in achieving defect-free ordered arrangements with the experimentally realized multiplication factors being limited. This study proposes an innovative method to guide cylindrical PS-b-PMMA, achieving a maximum multiplication factor of 48×. The honeycomb guiding templates for DSA were fabricated through a two-step process involving lithography and trimming, resulting in long-range ordered block copolymers microdomains. The ingenious trimming of the exposure pattern doubles the density of the guiding pattern, and the resulting boomerang-shaped, triaxially symmetric template provides a more robust anchoring mechanism, demonstrating the potential for achieving high multiplication factors. Additionally, the DSA effects were validated through simulation using a coarse-grained model. This guiding scheme achieves ordered nanopore arrays with excellent placement accuracy, pattern uniformity, and transferability, offering a feasible pathway for the high-density multiplication of cylindrical phases. It presents a promising solution for scalable nanomanufacturing.