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August 19, 2025Transactions on Computer Science and Intelligent Systems ResearchOpen Access

Research on Photolithography Technology and Photoresist Materials in Chip Manufacturing

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RHRui Huang

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Overview

Research explores photolithography's resolution challenges and evaluates novel photoresists, suggesting improvements for semiconductor manufacturing.

Key Points

  • Higher resolution and smaller feature sizes are essential for advancing semiconductor manufacturing, emphasizing lithography's critical role.
  • This research highlights the advantages of novel inorganic photoresists in Extreme Ultraviolet lithography compared to conventional types.
  • Systematic investigation reveals how factors like composition and exposure dose influence photoresist performance in EUV and DUV processes.
  • Optimization proposals aim to enhance photoresist characteristics, advancing semiconductor technology towards greater precision and eco-friendliness.

Cite This Study

Rui Huang (2025) studied this question.

synapsesocial.com/papers/68af55ccad7bf08b1eadc278https://doi.org/10.62051/msyd5c27
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