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August 22, 2025Photonics2 citationsOpen Access

Interferometric Imaging for Rapid Measurement of Wafer Surface Topography

Rapid Full-Field Surface Topography Measurement of Large-Scale Wafers Using Interferometric Imaging

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Authors

RYRuifang YeJZJiarui ZengHZHai Zhang

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Overview

Interferometric system measures wafer topography with high precision, suggesting robust industrial applications.

Key Points

  • This new system achieves relative deviations below 3% in bow and warp compared to commercial interferometers, ensuring accuracy.
  • Topographic information is directly extracted from the interference fringe pattern, enhancing measurement efficiency.
  • The method employs an optical flat and collimated beam to create high-contrast interference fringes across large-scale wafers.
  • With a simple optical layout and low cost, this technique may significantly improve wafer inspection processes.

Cite This Study

Ye et al. (2025) studied this question.

synapsesocial.com/papers/68af55d1ad7bf08b1eadc54fhttps://doi.org/10.3390/photonics12090835
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