Direct synthesis of patterned multi-walled carbon nanotubes shows enhanced emission characteristics, indicating their potential in electronic devices.
The integration of vertically aligned carbon nanotubes (CNTs) onto glass substrates is a critical step toward realizing transparent and microfabrication-compatible electronic devices. The direct synthesis of patterned vertically aligned multi-walled CNTs (MWCNTs) on glass substrates using chemical vapor deposition (CVD) is demonstrated. Photolithographic patterning was employed prior to CNT growth to define the spatial geometry of the vertically aligned MWCNTs, enabling precise control over the emitter layout. A key factor influencing CNT morphology was found to be the thickness of the Al buffer layer. Among the tested thicknesses, an aluminum (Al) buffer layer with a thickness of 5 nm yielded optimal results. This configuration facilitates the growth of highly aligned MWCNTs with an average length of approximately 7 μm and a number density of about 109 cm−2. The patterned MWCNTs exhibit excellent vertical alignment and well-defined hexagonal geometries consistent with photolithographic designs. Field emission measurements further validate the material quality, with patterned vertically aligned MWCNTs demonstrating uniform emission and good temporal stability. These results establish a practical and scalable approach for growing patterned vertically aligned MWCNTs directly on thermally stable glass substrates, offering a promising platform for transparent field emission technologies and CNT-based microsystems.
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Huang et al. (2025) studied this question.
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