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This analysis examines coating thickness and microstructure in thermal barrier coatings, indicating enhanced uniformity.
In this study, the effects of plasma assistance on the electron beam physical vapour deposition (EB-PVD) process were investigated using an industrial coater (Smart Coater ALD Vacuum Technologies GmbH) equipped with a dual hollow cathode system. This configuration enabled the generation of a plasma environment during the deposition of the ceramic top coat onto a metallic substrate. The objective was to assess how plasma assistance influences the microstructure and thickness distribution of 7% wt. yttria-stabilised zirconia (YSZ) thermal barrier coatings (TBCs). Coatings were deposited with and without plasma assistance to enable a direct comparison. The thickness uniformity and columnar morphology of the 7YSZ top coats were evaluated by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The mechanical properties of the deposited coatings were verified by the scratch test method. The results demonstrate that, in the presence of plasma, columnar grains become more uniformly spaced and exhibit sharper, well-defined boundaries even at reduced substrate temperatures. XRD analysis confirmed that plasma-assisted EB-PVD processes allow for maintaining the desired tetragonal phase of YSZ without inducing secondary phases or unwanted texture changes. These findings indicate that plasma-assisted EB-PVD can achieve desirable coating characteristics (uniform thickness and optimised columnar structure) more efficiently, offering potential advantages for high-temperature applications in aerospace and power-generation industries. Continued development of the EB-PVD process with the assistance of plasma generation could further improve deposition rates and TBC performance, underscoring the promising future of HC-assisted EB-PVD technology.
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Maciaszek et al. (2025) studied this question.
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