Interfacial Reactions Between Atomic Layer Deposited NiOx Hole Transport Layers and Metal Halide Perovskites in n-i-p Perovskite Solar Cells

Nitin Mallik; Javid Hajhemati; Vincent Dufoulon; Damien Coutancier; Elif Hüsam; Davide Regaldo; Iwan Zimmermann; Karim Medjoubi; Michael A. Anderson; Damien Aureau; Mathieu Frégnaux; Roberto Félix; Regan G. Wilks; Nathanaëlle Schneider; Marcus Bär; Philip Schulz

doi:10.1039/d5el00044k

January 1, 2025EES solar.Open Access

Interfacial Reactions Between Atomic Layer Deposited NiOx Hole Transport Layers and Metal Halide Perovskites in n-i-p Perovskite Solar Cells

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Key Points

Interfacial reactions between NiOx and metal halide perovskites impact the efficiency of solar cells.
The study identifies stability concerns linked to the hole transport layer in solar cell applications.
Atomic layer deposited NiOx layers demonstrate significant interaction with perovskite materials.
Understanding these reactions is crucial for optimizing perovskite solar cell performance and reliability.

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Implication

Observational analysis reveals critical interfacial reactions affect efficiency in perovskite solar cells, highlighting stability challenges.

Abstract

The hole transport layer (HTL) plays a critical role for the stability and efficiency of perovskite solar cells (PSCs) as it forms a direct interface with the metal halide perovskite...

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Mallik et al. (2025) studied this question.

synapsesocial.com/papers/68d454d831b076d99fa5aab0 https://doi.org/10.1039/d5el00044k

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Interfacial Reactions Between Atomic Layer Deposited NiOx Hole Transport Layers and Metal Halide Perovskites in n-i-p Perovskite Solar Cells

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Implication

Abstract

Discussion

Cite This Study

Interfacial Reactions Between Atomic Layer Deposited NiOx Hole Transport Layers and Metal Halide Perovskites in n-i-p Perovskite Solar Cells

Key Points

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Implication

Abstract

Discussion

Cite This Study

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