Nano Lithography of Stencil Mask (Resolution up To 20 nm) in The Manufacture of Wafer Nanowires

Note: In this technique, a thin plate with designed apertures, called a stencil mask, is placed adjacent to the substrate and used in combination with material evaporation. be. Evaporated material stops at the upper surface of the stencil mask, except in the openings. So the material grows with specific patterns determined by the stencil mask.Using appropriate stencil masks, nanopatterned materials can be grown at wafer scale in one shot. Resolution down to 20 nm has been achieved and can be used on non-conventional substrates such as rope , but this technique suffers from some problems related to deposition. Shade under the stencil mask tolerates lifetime issues due to stencil mask deterioration caused by material depositing at the edge of the holes, eventually blocking them (occlusion effect). Advances such as the use of dynamic stencil masks have increased the range of applications of this technique.