Halogen Bonding in Perfluoroalkyl Adsorption

Adsorption is a promising technology to remove perfluoroalkyl substances (PFAS), including perfluorooctanesulfonic acid (PFOS) and perfluorooctanoic acid (PFOA), from contaminated water. Although a large number of materials have been evaluated for PFAS adsorption, guidelines that can facilitate the rational design and selection of adsorbents have not been established due to the lack of a mechanistic understanding on the molecular level. Using a novel interpretation of the Freundlich isotherm, this study identifies halogen bonding as the main mechanism controlling perfluoroalkyl adsorption by using a materiomic approach that compares the electrostatic polarities of a variety of carbon, polymer, and mineral-based materials reported in the literature. Comparisons show that both PFOS and PFOA are favorably adsorbed by materials containing high densities of π electrons, lone electron pairs, and negative charges, consistent with the formation of halogen bonding between the positive σ-hole of fluorine as a Lewis acid and a nucleophilic solid as a Lewis base. The identification of this previously unappreciated noncovalent bonding mechanism offers fresh insight into the search of suitable materials for perfluoroalkyl adsorption.