Super-resolution Microscopy and Photo-lithography: How can one inspire the other

The principles of microscopy and lithography projection techniques are similar. To improve the resolution of the microscope or further reduce the image projection, both techniques face similar limitations, diffraction limits. The diffraction limit is a limitation of physical optics. In the development process of microscopes, to improve optical microscopy technology, researchers have proposed the idea of reducing the wavelength of light sources and increasing the numerical aperture based on the principle of diffraction limit generation. Modern scientists have proposed techniques to break through the diffraction limit and gradually increase the resolution of microscopes to further improve resolution. These breakthroughs also provide ideas for lithography technology, and researchers have invented techniques such as immersion lithography, multi-exposure, and two-photon direct writing. This article introduces the development process of super-resolution microscopy and lithography technology and analyzes the inspiration and influence of microscopy technology on lithography technology, that is, providing ideas for improving the accuracy of lithography technology.