Analyses of eSiGe Defects Induced by Outdoor Airborne Nanoparticles

A comprehensive investigation was conducted with the goal of measuring the impact of outdoor airborne nanoparticles on defect generation during the manufacturing process. During periods of elevated airborne particle levels and increased occurrences of eSiGe (embedded Silicon-Germanium) defects, experimental bare wafers were employed to collect airborne particles. The examination of defect counts facilitated the confirmation of the sources of defects. Given the complex web of factors influencing defects within the manufacturing environment, a sophisticated data processing algorithm was developed to pinpoint the specific role of nanoparticles in the total count of defect particles within a single, particle-sensitive manufacturing step. In this pilot-scale study, outdoor nano contamination affected a total of 13 out of 120 data collection days across three different fabrication sites, leading to overgrowth defects in the embedded Si-Ge process. The unique aspect of this study involves explaining the influence of outdoor nanoparticles on eSiGe defects using both a short-term experimental method and a long-term inline data science approach.