The process of alignment of the initial microgeometry of samples obtained by the method of selective electron beam melting (EBM) by electrochemical etching in aqueous solutions of NaCl under current density 20, 30 and 40 A/cm2 was studied. The possibility of reducing the parameters Ra and Rz from the values of 35 and 180 µm, respectively, to the values of 7.2 and 33 µm during the electrolysis time of 40 s under galvanostatic conditions with the removal of the allowance of 210 µm is shown. Keywords:selective electron beam melting, surface roughness, high speed electrochemical dissolution katusha0112@yandex.ru, morgunov56@mail.ru, sbp47@mail.ru, iliaslusar42@yandex.ru, smsergei1@yandex.ru
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