Metalenses, as a new type of planar optical device with flexible design, play an important role in miniaturized and integrated optical devices. Propagation phase-based metalenses, known for their low loss and extensive design flexibility, are widely utilized in optical imaging and optical communication. However, fabrication errors introduced by thin-film deposition and etching processes inevitably result in variations in the height of the metalens structure, leading to the fabricated devices not performing as expected. Here, we introduce a reflective TiO
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Qiu et al. (2024) studied this question.
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