Polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of aluminum oxide hard masks

Bottom-up nanofabrication with area-selective deposition provides a viable way to minimize edge placement error in semiconductor manufacturing. Here we developed a class of polymers, polypeptoids, as growth promoters that enhance nucleation and growth of metal oxides in vapor phase infiltration for area-selective deposition, generating aluminum oxide hard masks for pattern transfer with high selectivity. This material platform, with its capability to efficiently promote metal oxide growth and versatility in monomer-level chemical functionality control, will enable new area-selective deposition and pattern transfer methods.