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March 28, 2024Japanese Journal of Applied Physics

Mask innovations on the eve of High NA EUV lithography

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VPVicky PhilipsenAFAndreas FrommholdDTDevesh Thakare

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Philipsen et al. (2024) studied this question.

synapsesocial.com/papers/68e71ee5b6db64358769904bhttps://doi.org/10.35848/1347-4065/ad38c7
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