EM (Electro Migration) performance is a key item to evaluate the reliability of the integrated circuit production. Nevertheless, with the scaling down of size and more complicated process, reliability has to face various serious challenges. In this work, we adjusted the top metal etching profile in the 28HKMG process and improved the EM performance effectively.
No takes yet. Share an insight, caveat, or question.
Cao et al. (2024) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: