Volatile organic contamination (VOC) may deposit on the surfaces of wafers and damage final products. A good cleaning process can minimize the presence of VOCs in the manufacturing parts after a long-term usage. This study describes the optimization of a micro-chamber (µ-chamber)-based extraction method coupled with a thermal desorption - gas chromatography/mass spectroscopy (TD-GCMS) analysis. Next, the optimized sampling and analytical methods were validated by using a standard mixture of hydrocarbons, which proved the validity of the developed methods. Finally, the proposed method was successfully applied for the quantification of VOCs in real washed coupons, demonstrating its capability for the evaluation of VOC emissions in semiconductor cleaning processes.
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Ling Wang (2024) studied this question.
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