Plasmonic metasurface arrays for cross-reactive sensing

In this manuscript we present the steps required to fabricate, modify, and measure a plasmonic metasurface array for cross-reactive sensing applications. Multiple arrays of gold nanostructures were fabricated using a standard top-down electron-beam lithography process and then enclosed in a microfluidic chamber. Partial-selectivity was then achieved by using different thiol chemistries to modify each array. Finally, measurements of various samples were taken using a custom-built microscope setup.