Optical Evanescent Field for Direct Observation of Sub-100nm Particle Motion on Glass Surface

To directly investigate the dynamic nanoscale phenomenon on the surface being processed in wet conditions such as precision polishing, and cleaning in semiconductor industrial, an optical method for visualization and observation of each sub-100 nm sized particle that is moving on an interface such as a silica glass surface by applying an evanescent field have been proposing. Subsequently, we developed an experimental apparatus equipped with an optical microscopy system for verifying the moving particle observation method in a laboratory scale. This article introduces some experimentally direct observation results of duplicated wet processes.