Innovation demonstrates non-destructive, high-fidelity patterning in terahertz metasurfaces, implying enhanced production for advanced photonics.
Microscale patterning of delicate materials such as colloidal nanoparticle monolayers, solvent‐swollen polymer substrates, and 3D resonators in millimeter/terahertz (mm/THz) dielectric metasurface remains a formidable challenge for conventional photolithography. Overcoming these limitations is critical for the next generation of wearable electronics, photonic devices, and metamaterials. Here, a versatile strategy using photocurable perfluoropolyether (PFPE) is introduced to create high‐precision, reusable soft template guided by predesigned photomasks. These templates enable non‐destructive, high‐fidelity transfer of diverse functional materials including metal films, composites, and nanoparticle monolayer onto a wide range of substrates. Remarkably, the PFPE template can be reused multiple times without compromising patterning fidelity, offering a cost‐effective solution for large‐scale manufacturing. Beyond general microscale patterning, this approach provides unprecedented control over 3D dielectric resonators in mm/THz all‐dielectric metasurfaces, delivering superior electromagnetic performance. With its combination of precision, reusability, and adaptability to various surfaces, this method opens exciting opportunities for microscale fabrications across flexible electronics, advanced photonics, and metasurfaces, redefining what is possible with soft‐template patterning.
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Li et al. (2025) studied this question.
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